Effect of multistep annealing on mechanical and surface properties of electroplated Cu thin films
β Scribed by A. K. Sikder; Ashok Kumar; P. Shukla; P. B. Zantye; M. Sanganaria
- Book ID
- 107452962
- Publisher
- Springer US
- Year
- 2003
- Tongue
- English
- Weight
- 271 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0361-5235
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π SIMILAR VOLUMES
Mechanical properties and surface characterizations of Ba 0.7 Sr 0.3 TiO 3 thin films deposited on silicon substrate by metalorganic decomposition (MOD) method under different annealing temperatures were investigated. Hardness, Young's modulus and the contact stress-strain of the films were achieved
Pure Cu and Cu(Fe) thin films containing ~0.1 and ~1.0 at % Fe were prepared by low-temperature deposition onto a liquid-helium-cooled substrate. The Cu (Fe ) films were annealed sequentially at approximately 17, 70, and 270 K. After each annealing stage the resistivity was measured down to ~l.5 K.