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Effect of heat treatment on the oxygen content and resistivity in sputtered NiO films

โœ Scribed by O Kohmoto; H Nakagawa; Y Isagawa; A Chayahara


Book ID
114224087
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
61 KB
Volume
226-230
Category
Article
ISSN
0304-8853

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Effect of oxygen content on the electroc
โœ MG Hutchins; Na Kamel; K. Abdel-Hady ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 332 KB

Tungsten oxide films have been deposited at room temperature from metallic tungsten target onto ITO coated glass substrate with sheet resistance of 15 V/ร using reactive rf magnetron sputtering. The films formed in an Ar+2-25% O 2 gas mixture with total pressure of 10 m Torr and sputtering power 300