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Effect of Ge-related mechanical strain on defect and impurity behaviour in ion-implanted silicon

✍ Scribed by Yu. Suprun-Belevich; L. Palmetshofer


Book ID
113286826
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
476 KB
Volume
106
Category
Article
ISSN
0168-583X

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## Abstract The presence of boron in silicon has been shown to have a deleterious effect on the luminescence of interstitial‐related centres, particularly the W‐centre which is often observed after ion implantation and a low temperature anneal. Competition between silicon‐interstitial and boron‐int