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Effect of gas exposure on the EPR signal from amorphous silicon films

โœ Scribed by D.J. Miller; D. Haneman


Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
371 KB
Volume
27
Category
Article
ISSN
0038-1098

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Effect of post-deposition treatments on
โœ K. F. Feenstra; P. F. A. Alkemade; E. Algra; R. E. I. Schropp; W. F. van der Weg ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 167 KB ๐Ÿ‘ 2 views

The eect of dierent post-deposition treatments on the structure of Hot-Wire (HW) deposited intrinsic a-Si:H thin ยฎlms is investigated. These treatments are applied in order to rehydrogenate the top region of the ยฎlm, which, due to the high deposition temperatures of these ยฎlms, becomes depleted of h