Effect of erbium interlayer on nickel silicide formation on Si(1 0 0)
β Scribed by W. Huang; Y.L. Min; G.P. Ru; Y.L. Jiang; X.P. Qu; B.Z. Li
- Book ID
- 108060377
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 479 KB
- Volume
- 254
- Category
- Article
- ISSN
- 0169-4332
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Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha