Effect of dopant redistribution, segregation, and carrier trapping in As-implanted MOS gates

✍ Scribed by Batra, S.; Park, K.; Lin, J.; Yoganathan, S.; Lee, J.C.; Banerjee, S.K.; Sun, S.W.; Lux, G.

• Book ID: 114536974
• Publisher: IEEE
• Year: 1990
• Tongue: English
• Weight: 994 KB
• Volume: 37
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.62295