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Dopant redistribution and crystalline damage removal during rapid thermal annealing of Be and Mg implants in Ga0.47In0.53As

✍ Scribed by J.H. Wilkie; G.D.T. Spiller; I.D. Henning; B.J. Sealy


Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
358 KB
Volume
85
Category
Article
ISSN
0022-0248

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