๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Effect of deuterium on the growth process of poly-silicon film by hot-wire chemical vapour deposition

โœ Scribed by J.K Rath; R.E.I Schropp


Book ID
117145633
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
171 KB
Volume
299-302
Category
Article
ISSN
0022-3093

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Effect of post-deposition treatments on
โœ K. F. Feenstra; P. F. A. Alkemade; E. Algra; R. E. I. Schropp; W. F. van der Weg ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 167 KB ๐Ÿ‘ 2 views

The eect of dierent post-deposition treatments on the structure of Hot-Wire (HW) deposited intrinsic a-Si:H thin ยฎlms is investigated. These treatments are applied in order to rehydrogenate the top region of the ยฎlm, which, due to the high deposition temperatures of these ยฎlms, becomes depleted of h