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Effect of deposition rate and a-Si precursor or cap layer on structure and magnetic properties of iron films on silicon substrates

✍ Scribed by A.S. Gouralnik; N.G. Galkin; V.A. Ivanov; A.I. Cherednichenko; V.S. Plotnikov; E.V. Pustovalov

No coin nor oath required. For personal study only.

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