Effect of deposition parameters on the superhardness and stoichiometry of nanostructured Ti–Hf–Si–N films

✍ Scribed by A. D. Pogrebnyak; V. M. Beresnev; A. P. Shpak; P. Konarskii; F. F. Komarov; G. V. Kirik; N. A. Makhmudov; D. A. Kolesnikov; V. V. Uglov; O. V. Sobol; M. V. Kaverin; V. V. Grudnitskii

• Book ID: 113079272
• Publisher: Springer
• Year: 2012
• Tongue: English
• Weight: 674 KB
• Volume: 54
• Category: Article
• ISSN: 1573-9228
• DOI: 10.1007/s11182-012-9734-4