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Effect of CH4partial pressure on the microstructure and mechanical properties of magnetron sputtered TiC films

✍ Scribed by Nan Shao; Lan Feng; Fanghua Mei; Geyang Li


Book ID
111590716
Publisher
Springer
Year
2004
Tongue
English
Weight
172 KB
Volume
39
Category
Article
ISSN
0022-2461

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Constitution, microstructure, mechanical
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## Abstract Amorphous carbon films with additions of silicon were deposited by non‐reactive magnetron sputtering on WC‐Co hard metal and on silicon substrates. The targets were hot‐pressed, homogenous mixtures of graphite and silicon carbide powder. Additional argon ion bombardment of the growing f