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Effect of cell resonance on depth profiling in photoacoustic FTIR spectra

✍ Scribed by J.C. Donini; K.H. Michaelian


Book ID
107768066
Publisher
Elsevier Science
Year
1984
Weight
556 KB
Volume
24
Category
Article
ISSN
0020-0891

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## Abstract A very simplified model of atomic‐scale etch pitting during sputtering erosion for composition depth profiling is used to modify the Benninghoven–Hofmann approach to layer‐by‐layer sputtering. It is shown that analytically tractable defining equations result, with solutions that indicat