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Effect of boron ion implantation and subsequent anneals on the properties of Si nanocrystals

✍ Scribed by G. A. Kachurin; S. G. Cherkova; V. A. Volodin; D. M. Marin; D. I. Tetel’baum; H. Becker


Book ID
111443441
Publisher
Springer
Year
2006
Tongue
English
Weight
214 KB
Volume
40
Category
Article
ISSN
1063-7826

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