Effect of atomic-hydrogen irradiation on reduction of residual carrier concentration in β-FeSi2 films grown on Si substrates by atomic-hydrogen-assisted molecular beam epitaxy

✍ Scribed by Funase, Y.; Suzuno, M.; Toko, K.; Suemasu, T.

• Book ID: 121891722
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 590 KB
• Volume: 378
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/j.jcrysgro.2012.12.061