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Influences of residual oxygen impurities, cubic indium oxide grains and indium oxy-nitride alloy grains in hexagonal InN crystalline films grown on Si(111) substrates by electron cyclotron resonance plasma-assisted molecular beam epitaxy

✍ Scribed by T. Yodo; T. Nakamura; T. Kouyama; Y. Harada


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
375 KB
Volume
2
Category
Article
ISSN
1862-6351

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