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Effect of argon on the structure of hydrogenated nanocrystalline silicon deposited from tetrachlorosilane/hydrogen/argon plasma

✍ Scribed by Zhang, Lin ;Gao, Junhua ;Xiao, Jinquan ;Wen, Lishi ;Gong, Jun ;Sun, Chao


Book ID
112180960
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
613 KB
Volume
209
Category
Article
ISSN
0031-8965

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