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Annealing Effect on Enlargement of Grain Size in Nanocrystalline Silicon Films Deposited by Silicon Evaporation with Oxygen and Argon Radicals

✍ Scribed by Nakamura, Kazuhiro; Hirata, Makoto; Yokota, Katsuhiro


Book ID
121474871
Publisher
Institute of Pure and Applied Physics
Year
2005
Tongue
English
Weight
135 KB
Volume
44
Category
Article
ISSN
0021-4922

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