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Effect of annealing in oxygen atmosphere on morphological and electrical properties of iridium and ruthenium thin films prepared by liquid delivery MOCVD

✍ Scribed by Marco Lisker; Tetyana Hur’yeva; Yves Ritterhaus; Edmund P. Burte


Book ID
118501293
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
740 KB
Volume
201
Category
Article
ISSN
0257-8972

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