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Effect of a titanium nitride interlayer on the endurance and composition of a molybdenum disulfide coating prepared by ion-beam-assisted deposition

โœ Scribed by L.E. Seitzman; I.L. Singer; R.N. Bolster; C.R. Gossett


Book ID
107930218
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
481 KB
Volume
51
Category
Article
ISSN
0257-8972

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Effect of beam voltage on the properties
โœ J. H. Edgar; C. A. Carosella; C. R. Eddy; D. T. Smith ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Springer US ๐ŸŒ English โš– 709 KB

The effects of nitrogen-beam voltage on the structure, stress, energy band gap and hardness of AIN thin films deposited on Si (1 1 1), Si (1 00) and sapphire (0001) by ion beam assisted deposition (IBAD) are reported. As the nitrogen-beam voltage was increased from 50 to 200 V, the stress and disord