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Editorial: Silicon Carbide CVD for Electronic Device Applications

✍ Scribed by P. Wellmann; M. Pons

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
83 KB
Volume
12
Category
Article
ISSN
0948-1907

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✦ Synopsis

Abstract

Silicon carbide CVD for device applications is the topic of this Special Issue of Chemical Vapor Deposition. In this introduction, Guest Editors Michel Pons and Peter Wellman give an overview of the current technologies for SiC thin‐film growth with adjacent contributions on layer characterization, and comment on the challenges ahead.

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