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E-beam correction methods for cell projection optical system

✍ Scribed by H. Itoh; M. Sasaki; H. Todokoro; Y. Sohda; Y. Nakayama; N. Saitou


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
277 KB
Volume
21
Category
Article
ISSN
0167-9317

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Proximity correction for e-beam patterne
✍ L. Grella; E. Di Fabrizio; M. Gentili; M. Baciocchi; R. Maggiora πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 308 KB

In this paper we present two important issues often demanded when patterning DOEs using EBL: the first one is the attainment of accurate resist three-dimensional shaping to increase DOE efficiency, this task is accomplished by developing a new proximity correction algorithm able to shape the resist