Proximity correction for e-beam patterned sub-500nm diffractive optical elements

✍ Scribed by L. Grella; E. Di Fabrizio; M. Gentili; M. Baciocchi; R. Maggiora

• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 308 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(96)00194-3

✦ Synopsis

In this paper we present two important issues often demanded when patterning DOEs using EBL: the first one is the attainment of accurate resist three-dimensional shaping to increase DOE efficiency, this task is accomplished by developing a new proximity correction algorithm able to shape the resist in one shot of exposure. The second one is the proximity-effect correction of optical gratings having an axial symmetry, whose application is the microfabrication of Fresnel Zone Plates (FZPs); this problem requires the development of a specific algorithm that minimises the computation load by exploiting the grating symmetry. A description of these algorithms is given and examples of proximity compensated DOEs are presented.