๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Dynamics and control of thin film surface microstructure in a complex deposition process

โœ Scribed by Dong Ni; Panagiotis D. Christofides

Book ID
108086015
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
501 KB
Volume
60
Category
Article
ISSN
0009-2509

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Glancing angle deposition to control mic
Glancing angle deposition to control microstructure and roughness of chromium thin films
โœ Jan Lintymer; Nicolas Martin; Jean-Marie Chappe; Jamal Takadoum ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 942 KB

Glancing angle deposition (GLAD) was used to sculpt chromium thin films sputter deposited by dc magnetron sputtering into the desired zigzag microstructure. The flux angle of incident species ฮฑ was systematically varied from 0 to 50 โ€ข and periodically changed from ฮฑ to -ฮฑ. The total film thickness w

Microstructure and composition of TiC/a-
Microstructure and composition of TiC/a-C:H nanocomposite thin films deposited by a hybrid IPVD/PECVD process
โœ A.A. El Mel; B. Angleraud; E. Gautron; A. Granier; P.Y. Tessier ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 441 KB

Titanium containing amorphous carbon (TiC/a-C:H) films were deposited by a hybrid IPVD/PECVD (Ionized Physical Vapor Deposition/Plasma Enhanced Chemical Vapor Deposition) process combining titanium target magnetron sputtering and PECVD in an Ar-CH 4 plasma. Films with various carbon contents have be