Dry etching of III–V semiconductors: influence of substrate temperature on the anisotropy and induced damage : P. Van Daele, D. Lootens and P. Demeester. Vacuum41(4–6), 906 (1990)

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 127 KB
• Volume: 31
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(91)90178-a