7622. Dry etching of III–V semiconductors: influence of substrate temperature on the anisotropy and induced damage: P Van Daele et al, Vacuum, 41, 1990, 906–908

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 300 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91690-p