Dose rate and temperature dependence of Ge range profiles in Si obtained by channeling implantation

✍ Scribed by M Posselt; J Teichert; L Bischoff; S Hausmann

• Book ID: 114164439
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 977 KB
• Volume: 178
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(00)00505-x