✦ LIBER ✦
Dose-rate dependence of damage formation in Si by N implantation as determined from channeling profile measurements
✍ Scribed by G. Otto; G. Hobler; L. Palmetshofer; K. Mayerhofer; K. Piplits; H. Hutter
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 270 KB
- Volume
- 242
- Category
- Article
- ISSN
- 0168-583X
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