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Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices

✍ Scribed by Zhengxin Liu; Masato Osamura; Teruhisa Ootsuka; Shinan Wang; Yasuhiro Fukuzawa; Yasuhito Suzuki; Ryo Kuroda; Takahiro Mise; Naotaka Otogawa; Yasuhiko Nakayama; Hisao Tanoue; Yunosuke Makita

Book ID: 108233882
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 354 KB
Volume: 27
Category: Article
ISSN: 0925-3467
DOI: 10.1016/j.optmat.2004.08.040

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