✦ LIBER ✦

Distinction between interfacial layer effect and trap passivation effect of N2 plasma treatment on LTPS-TFTs

✍ Scribed by Ma, William Cheng-Yu

Book ID: 125817897
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 863 KB
Volume: 100
Category: Article
ISSN: 0038-1101
DOI: 10.1016/j.sse.2014.07.005

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Characteristics of /Poly-Si Interfacial

Characteristics of /Poly-Si Interfacial Layer on CMOS LTPS-TFTs With Gate Dielectric and Plasma Surface Treatment

✍ Ming-Wen Ma; Tsung-Yu Chiang; Woei-Cherng Wu; Tien-Sheng Chao; Tan-Fu Lei 📂 Article 📅 2008 🏛 IEEE 🌐 English ⚖ 978 KB

The effect of oxygen remote plasma treat

The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition

✍ Lee, Seungjun ;Bang, Seokhwan ;Park, Joohyun ;Park, Soyeon ;Jeong, Wooho ;Jeon, 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 358 KB

## Abstract We deposited ZnO thin films by atomic layer deposition (ALD) and then investigated the chemical and electrical characteristics after plasma treatment. The chemical bonding states were examined by X‐ray photoelectron spectroscopy (XPS). The XPS spectra of O 1s showed that the intensity o

Effect of Ar+Radiofrequency Plasma Treat

Effect of Ar+Radiofrequency Plasma Treatment Conditions on the Interfacial Adhesion Energy Between Atomic-Layer-Deposited Al2O3and Cu Thin Films in Embedded Capacitors

✍ Sung-Cheol Park; Young-Bae Park 📂 Article 📅 2008 🏛 Springer US 🌐 English ⚖ 684 KB