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Dissolution inhibition-type photoresists for deep-UV lithography

✍ Scribed by D. Funhoff; H. Binder; S. Nguyen-Kim; R. Schwalm

Book ID: 118148241
Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 561 KB
Volume: 20
Category: Article
ISSN: 0033-0655
DOI: 10.1016/0033-0655(92)80020-w

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