✦ LIBER ✦
Azido-m-meconine-‘high ortho’ Novolak resin-based negative photoresists for deep UV lithography
✍ Scribed by Maneesh Sharma; Anant A. Naik; Manoj Gaur; P. Raghunathan; S. V. Eswaran
- Book ID
- 107584513
- Publisher
- Indian Academy of Sciences,Royal Society of Chemistry
- Year
- 2009
- Tongue
- English
- Weight
- 315 KB
- Volume
- 121
- Category
- Article
- ISSN
- 0253-4134
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