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Azide-phenolic resin photoresists for deep UV lithography

✍ Scribed by Iwayanagi, T.; Kohashi, T.; Nonogaki, S.; Matsuzawa, T.; Douta, K.; Yanazawa, H.

Book ID: 114593957
Publisher: IEEE
Year: 1981
Tongue: English
Weight: 805 KB
Volume: 28
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1981.20605

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