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Dislocation distribution in a strain-relaxed SiGe thin film grown on an ion-implanted Si substrate

✍ Scribed by Junji Yamanaka; Kentaro Sawano; Kumiko Suzuki; Kiyokazu Nakagawa; Yusuke Ozawa; Takeo Hattori; Yasuhiro Shiraki

Book ID: 108289124
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 245 KB
Volume: 508
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2005.08.392

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