Relaxed SiGe heteroepitaxy on Si with very thin buffer layers: experimental LEPECVD indications and an interpretation based on strain-dependent dislocation nature

✍ Scribed by A. Marzegalli; F. Montalenti; M. Bollani; Leo Miglio; G. Isella; D. Chrastina; H. von Känel

• Book ID: 104050220
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 489 KB
• Volume: 76
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2004.07.031