Discharge Conditioning for Isotope Ratio Measurements by Glow Discharge Optogalvanic Spectroscopy
β Scribed by R. W. Shaw; C. M. Barshick; L. W. Jennings; J. P. Young; J. M. Ramsey
- Publisher
- John Wiley and Sons
- Year
- 1996
- Tongue
- English
- Weight
- 521 KB
- Volume
- 10
- Category
- Article
- ISSN
- 0951-4198
No coin nor oath required. For personal study only.
β¦ Synopsis
Several methods were explored for improving the glow discharge optogalvanic signal that can be used for determining uranium isotope ratios. The discharge was conditioned by purification of the argon feed gas, use of a non-evaporable zirconium alloy getter, condensation of discharge impurities on a cooling loop near -18O"C, and inclusion of tantalum metal in the sample cathodes to serve as a source of sputtered Ta atoms. Signal improvements of up to 20-fold were observed.
π SIMILAR VOLUMES
R.f. glow discharge optical spectroscopy (GDOS) is demonstrated to be a useful technique with which to measure absolute dopant concentrations in hydrogenated amorphous silicon (a-Si:H) films. The measurement technique and method of calibration are described. GDOS measurements of boron concentrations
A method for the determination of the thickness and composition of zinc-based coatings on steel has been developed. The method is based on direct current glow discharge optical emission spectroscopy (GD-OES). Six different types of coated materials supplied by five major European steel producers hav