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Direct simulation Monte Carlo analysis of flows and etch rate in an inductively coupled plasma reactor

✍ Scribed by Nanbu, K.; Morimoto, T.; Suetani, M.

Book ID: 114558841
Publisher: IEEE
Year: 1999
Tongue: English
Weight: 543 KB
Volume: 27
Category: Article
ISSN: 0093-3813
DOI: 10.1109/27.799816

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