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Direct Comparison of ZrO 2 and HfO 2 on Ge Substrate in Terms of the Realization of Ultrathin High-κ Gate Stacks

✍ Scribed by Kamata, Yoshiki; Kamimuta, Yuuichi; Ino, Tsunehiro; Nishiyama, Akira

Book ID: 124079495
Publisher: Institute of Pure and Applied Physics
Year: 2005
Tongue: English
Weight: 482 KB
Volume: 44
Category: Article
ISSN: 0021-4922
DOI: 10.1143/JJAP.44.2323

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