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Diffusion profiles of high dosage Cr and V ions implanted into silicon

✍ Scribed by Zhang, P.; Stevie, F.; Vanfleet, R.; Neelakantan, R.; Klimov, M.; Zhou, D.; Chow, L.


Book ID
120656584
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
827 KB
Volume
96
Category
Article
ISSN
0021-8979

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