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Diffusion length measurement and silicon quality

✍ Scribed by P.A. Iles


Publisher
Elsevier Science
Year
1982
Weight
328 KB
Volume
7
Category
Article
ISSN
0379-6787

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Diffusion length measurements on plasma-
✍ M. Akani; J.E. Bouree; R. Suryanarayanan; M. Rodot; G. Brun; M. Caymax πŸ“‚ Article πŸ“… 1987 πŸ› Elsevier Science βš– 277 KB

The plasma spray technique was used to obtain p-type polycrystalline silicon deposits 200 #m -2 mm thick and of area 1 cm 2. Silicon layers 50 #m thick were grown on these deposits by chemical vapour deposition. The electronic diffusion length of plasma-sprayed silicon was found to be in the range 9