Different strain relaxation mechanisms in strained Si/Si1−xGex/Si heterostructures by high dose B+ and BF2+ doping

✍ Scribed by ChangChun Chen; Ann-Chatrin Lindgren; ShiLi Zhang; DeZhang Zhu; A. Vantomme

• Book ID: 114166268
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 173 KB
• Volume: 198
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(02)01491-x