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Device linearity improvement of In 0.49 Ga 0.51 P/In 0.15 Ga 0.85 As doped-channel FETs with a metal plug alloy process

โœ Scribed by Chien, Feng-Tso; Liao, Chien-Nan; Yin, Jin-Mu; Chiu, Hsien-Chin; Tsai, Yao-Tsung


Book ID
127250216
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
393 KB
Volume
23
Category
Article
ISSN
0268-1242

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Comparison of BCP error with current and charge density distribution errors in the benchmark geometry has been carried out using the benchmark solutions and error metric for surface currents [8]. A correlation of BCP error with near-field electromagnetic characterization of the problem has been show