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Development of a low pressure microwave excited plasma and its application to the formation of microcrystalline silicon films

✍ Scribed by Kikukawa, Daisuke; Hori, Masaru; Honma, Koichiro; Yamamoto, Masahiro; Goto, Toshio; Takahashi, Shunji; Den, Shoji

No coin nor oath required. For personal study only.

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