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Determination of the argon content of sputtered SiO2 films by X-ray fluorescence

✍ Scribed by W. Hoffmeister; M. Zuegel

Publisher: Elsevier Science
Year: 1969
Tongue: English
Weight: 263 KB
Volume: 3
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(69)90109-6

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