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Argon content of SiO2 films deposited by rf sputtering in argon : G. C. Schwartz and R. E. Jones. IBM J. Res. Dev. 14, January (1970), p. 52

Publisher: Elsevier Science
Year: 1970
Tongue: English
Weight: 101 KB
Volume: 9
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(70)90216-7

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