✦ LIBER ✦
Argon content of Si and SiO2 films deposited through RF sputtering in argon: R E Jones, M A Zuegel and G G Schwartz, IBM Components Division, East Fishkill Facility, Hopewell Junction, NY 12533, USA
- Publisher
- Elsevier Science
- Year
- 1968
- Tongue
- English
- Weight
- 117 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0042-207X
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