Numerical Study of a Three-Dimensional C
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Alexandre Ern; Vincent Giovangigli; Mitchell D. Smooke
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Article
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1996
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Elsevier Science
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English
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the reactor, chemical reactions in the gas phase and on the substrate surface, and multicomponent diffusion processes A numerical model of a three-dimensional, horizontal channel, chemical vapor deposition reactor is presented in order to study of precursor species in the gas phase due to temperatur