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Detailed in-situ monitoring of film growth: application to TiSi2 chemical vapor deposition

✍ Scribed by M.A. Mendicino; E.G. Seebauer

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 803 KB
Volume: 134
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(93)90148-p

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