Detachment Lithography of Photosensitive Polymers: A Route to Fabricating Three-Dimensional Structures

✍ Scribed by Junghoon Yeom; Mark A. Shannon

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 785 KB
• Volume: 20
• Category: Article
• ISSN: 1616-301X
• DOI: 10.1002/adfm.200900686

✦ Synopsis

Abstract

A technique to create arrays of micrometer‐sized patterns of photosensitive polymers on the surface of elastomeric stamps and to transfer these patterns to planar and nonplanar substrates is presented. The photosensitive polymers are initially patterned through detachment lithography (DL), which utilizes the difference in adhesion forces to induce the mechanical failure in the film along the edges of the protruded parts of the mold. A polydimethylsiloxane (PDMS) stamp with a kinetically and thermally adjustable adhesion and conformal contact can transfer the detached patterns to etched or curved substrates, as well as planar ones. These printed patterns remain photochemically active for further modification via photolithography, and/or can serve as resists for subsequent etching or deposition, such that photolithography can be used on highly nonconformal and nonplanar surfaces. Various 3D structures fabricated using the process have potential applications in MEMS (micro‐electromechanical systems) sensors/actuators, optical devices, and microfluidics.