Detachment Lithography of Photosensitive
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Junghoon Yeom; Mark A. Shannon
📂
Article
📅
2010
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John Wiley and Sons
🌐
English
⚖ 785 KB
## Abstract A technique to create arrays of micrometer‐sized patterns of photosensitive polymers on the surface of elastomeric stamps and to transfer these patterns to planar and nonplanar substrates is presented. The photosensitive polymers are initially patterned through detachment lithography (D