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Design of high-Q 3-D integrated inductors for high frequency applications

✍ Scribed by Dae-Hee Weon; Jeong-Il Kim; Saeed Mohammadi


Book ID
106342311
Publisher
Springer
Year
2006
Tongue
English
Weight
312 KB
Volume
50
Category
Article
ISSN
0925-1030

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## Abstract This letter presents the results of a new 3‐D high‐performance coil inductor, which was fabricated using standard 0.25 ΞΌm CMOS technology. Comparative evaluation with the conventional spiral inductor was performed in terms of quality factor (__Q__), inductance (__L__), and chip area. ©

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## Abstract Spiral inductors with various turn numbers fabricated with the use of leading‐edge 0.13‐μm mixed‐signal/RF CMOS technology with 193‐nm lithography and Cu/low‐k interconnect are described in this article. It is shown that quality (Q) factor decreased and increased with increasing tempera